اسپاترینگ صنعتی با پمپ توربو و سیستم Roughing & Backing

Magnetron Sputtering system is a vacuum process used to deposit thin films on substrate for a wide variety of commercial and scientific purposes, such as making ultrathin semiconductors, metal films, etc. The desired operating pressure is obtained by a pump (usually a two-stage, a turbomolecular pumped “backed” by a rotary pump), with an inert gas, such as argon admitted to the chamber by a fine control (leak) valve. Satalab Sputtering System is one of the best choice in this field.

 

Features

Specifications

No. of Cathode

3 x 2” or 4”

Rough Vacuum

Rotary Vane Pump

High Vacuum

Turbo Molecular Pump

Vacuum system

Standard Backing & Roughing

Backing & Roughing System

By 3 High Vacuum Electrical Valves

Target Moving

Linear Independent Moving For Max Rate

Chuck

Moving Hot Plate

DC Power

100 to 500 V dc 500 watt

Target Cooling

3 target Water Cooling

Warranty

1 Year

Training and technical support

In Training Center And Free Remote Support

Integration

With Glove Box & Spin Coater